Title: Plasma Ion Sources Development and Applications
Y. Chen (UCB-NE)

Plasma ion sources play an important role in many fields. Specific
requirements for different applications should be well considered
during the development of ion sources. Here three types of plasma ion
sources for specific applications will be presented. The ion beam
imprinting system equipped with a multicusp plasma ion source is
developed to perform micromachining, surface modification, and ion
implantation etc. And also a metallic plasma ion source has been
developed for the deposition of various metallic thin films. As an
application, nanopore and nanoslit have been fabricated by depositing
copper thin film on the pre-fabricated Si3N4 membrane. Beside, a
filament plasma ion source is developed to generate high current
density C60 ion beam for bio time-of-flight secondary ion mass
spectrometry (TOF-SIMS).